The Cleanroom (Nanofabrication Lab/NANOLAB) is located at the SNA building and occupies a 760 m2 ISO Level 5 area. This space houses state-of-the-art equipment that is used to produce electronic and optoelectronic components, integrated circuits, and micro and nano-electro-mechanical systems. All of the equipment and infrastructure in the cleanroom is designed to be suitable for processing samples of various sizes, ranging from small samples to 6-inch wafer sizes.
The cleanroom provides a particulate-free and controlled environment that is ideal for wet and dry etching, as well as the coating of organic and inorganic, conductive, insulating, and semiconductor materials using a variety of methods. The cleanroom is equipped to perform horizontal and vertical scaling of structures, from a few nanometers to hundreds of micrometers. This allows for the production, analysis, and testing of single and multilayer functional structures, such as on-chip devices, sensors, systems, circuit elements, and circuits/indices.
