The Hitachi Ethos NX5000 is a high-performance triple beam system that uses different ion beams for etching, deposition, and cleaning. This system uses Ga ions for etching, C/W for deposition, and low-energy Ar ions for cleaning of the amorphous layer that results from Ga ion milling. This allows for precise control of the etching, deposition, and cleaning processes, making the Hitachi Ethos NX5000 a valuable tool for a wide range of materials research applications. The ability to use different ion beams for different processes allows for greater flexibility and precision in the fabrication of micro and nano-structures (e.g., TEM samples).