Location and Working Hours

The cleanroom at n^2STAR is located in the SNA building (SNA B182), occupying a 760 m^2 ISO Level 5 area that houses state-of-the-art equipment for the production of electronic/optoelectronic components, integrated circuits, and micro/nano-electro-mechanical systems. Our equipment and wet benches are designed to accommodate a wide range of sample sizes, from small samples to 6-inch wafers.

In our controlled, particulate-free environment, we offer the capability for wet and dry etching and coating of organic and inorganic, conductive, insulating, and semiconductor materials using various methods. We can perform horizontal and vertical scaling at a range of scales, from a few nanometers to hundreds of micrometers. This allows us to produce, analyze, and test single and multilayer functional structures in the form of on-chip devices, sensors, systems, circuit elements, and circuits/indexes.

Our MEMS/NEMS-Advanced Characterization Laboratory is located in SNA B137.

Our Advanced Spectroscopy and Electron Microscopy Laboratory is located in ENG-B203. This laboratory is equipped with dedicated high-resolution and atomic-resolution electron microscopes that enable imaging down to 0.68 Angstroms. Our capabilities include micro/nanoscale modification and prototyping using focused electrons and ions, as well as the determination, analysis, and classification of organic/inorganic molecular structures, chemical properties, and surface structures through spectroscopic methods.