The Kurt J. Lesker Company® PRO Line PVD 200 is a modular, full featured thin film deposition system allowing 6″ wafers and pieces.
A combined system that includes both thermal and electron beam evaporation in the same chamber
Process capability up to 150 mm substrates
8 e-beam source pockets (12 cc) with programmable sweep and automatic crucible indexing
1 thermal evaporation source
Film thickness can be controlled by QCM sensors
Mb,Ti, W, Ni, Cr, Al, Au, and Pt can be deposited