Cleanroom is located at SNA building (SNA B182) occupying a 760 m2 ISO Level 5 area that hosts state-of-the-art equipment to produce electronic/optoelectronic components, integrated circuits and micro/nano-electro-mechanical systems. All equipment infrastructure and wet benches are designed to be suitable for processing different samples ranging from small samples up to 6-inch wafer sizes. In a particulate-free and controlled area, the cleanroom offers the capability of wet and dry etching and coating of organic and inorganic, conductive, insulating and semiconductor materials by different methods. Horizontal and vertical scaling can be carried out, ranging from a few nanometers to hundreds of micrometers. In this way, the production, analysis and testing of single and multilayer functional structures (in the form of on-chip devices, sensors, systems, circuit elements and circuits/indexes) can be performed.
